As the miniaturization and advancement of semiconductor devices progresses, wiring line widths have reached the nanometer scale, making electromigration evaluation increasingly important for predicting product life and establishing design rules.
This evaluation equipment applies temperature stress, which is a lifespan acceleration factor, and highly accurate current stress to a large number of evaluation samples, and monitors resistance changes and time to breakdown.
It is also equipped with analysis software that helps to determine the necessary parameters for judging the life of a device.
This can contribute to improving the quality of next-generation semiconductors, from material development to process optimization and reliability assurance.

Main specifications
Stress current source Output range ±(0.01 to 50mA)
±(0.1 to 200mA)
±(0.1 to 500mA)
Compliance voltage +33 to -21V
Extrusion test voltage Output range -20 to +20V
Accuracy ± (2% of set point + 20mV)
Oven Temperature control range (Ambient temperature +70°C) to +350°C
Temperature uniformity ±3.5°C (at +350°C)
System variation
No. of evaluated channels 300ch
specification
200ch
specification
100ch
specification
EM module
Output current*
Oven 1 50mA/200mA/
500mA
50mA/200mA/
500mA
50mA/200mA/
500mA
Oven 2 50mA/200mA/
500mA
50mA/200mA/
500mA
-
Oven 3 50mA/200mA/
500mA
- -
DUT board Number of
installed units
30 (10 × 3 ovens) 20 (10 × 2 ovens) 10
IC socket 10 each per board (DIP 28-pin, 600mil and 300mil)
  • * Select one of three types of EM modules
Features for AEM Electromigration Evaluation System Systems

Monitor Screen

The monitor screen offers real-time information on the test progress, resistance, and rate of change of all DUTs at a glance.The test condition settings screen allows you to enter and review all items on a single screen.
Monitor screen

Analytical Software

The system is equipped with analysis software that automatically calculates the parameters necessary for judging the life of a device from reliability tests.
Both primary data and secondary data are automatically updated in real time as graphs, allowing you to visually grasp life trends even during testing.


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Photo of AEM Electromigration Evaluation System
LSI wiring (Cu/next-generation material) life degradation test under high temperatures

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Electromigration Evaluation System

LSI wiring (Cu/next-generation material) life degradation test under high temperatures

Photo of AEM Electromigration Evaluation System
LSI wiring (Cu/next-generation material) life degradation test under high temperatures